为满足光电设备及武器装备光学窗口对具有高可见光透过率和强电磁屏蔽效能功能材料的迫切需求,开展了金属网格透明薄膜的电磁屏蔽性能研究。通过在压印沟槽中刮填银浆和电镀铜的方法制备了网格形状不同、线宽不同、厚度不同的金属网格薄膜,并对其可见光透过率、雾度、方阻和电磁屏蔽效能进行了测试表征,研究了金属网格结构参数对其光学性能和电磁屏蔽性能的影响。结果表明,制备的金属网格薄膜透明度高,导电性好、电磁屏蔽性能优异,其在透光率85% 和雾度3% 的前提下,方阻低于0.2 Ω/sq,电磁屏蔽效能达35 dB 以上(0.95~18 GHz)。相比于其他结构参数,金属网格电磁屏蔽薄膜厚度的增加可在不影响光学性能的前提下显著提升其电磁屏蔽效能。
Abstract
In order to meet the urgent needs of optoelectronic devices and optical windows for transparent electromagnetic interference shielding materials with high optical transmittance and outstanding shielding effectiveness
research on electromagnetic shielding performance of transparent metal-mesh film is carried out. Metal-mesh films with different grid shapes
line widths and thicknesses are fabricated through the process of blading silver nanoparticle ink and electroplating Cu into the imprinted microgrooves. The effects of different structure parameters on the electromagnetic shielding
light transmittance and electrical conductivity of metal-mesh films are tested and analyzed. Results indicate that the fabricated metal-mesh film exhibits a shielding effectiveness (SE) up to 35 dB (0.95–18 GHz) and a sheet resistance less than 0.2 Ω/sq at 85% transmittance and 3% haze. Compared with other structure parameters
the increase of the thickness of the metal-mesh film can significantly improve its electromagnetic shielding effectiveness without affecting the optical performance.