杨波,许海鹰,桑兴华,王壮. 自适应闭环控制的高频脉冲电子束偏压电路设计[J]. 航空制造技术, 2025, 68(1/2): 90-94. YANG Bo, XU Haiying, SANG Xinghua, WANG Zhuang. Design of High Frequency Pulsed Electron Beam Bias Circuit With Adaptive Closed-Loop Control[J]. Aeronautical Manufacturing Technology, 2025, 68(1/2): 90-94.
YANG Bo, XU Haiying, SANG Xinghua, et al. Design of High Frequency Pulsed Electron Beam Bias Circuit With Adaptive Closed-Loop Control[J]. Aeronautical Manufacturing Technology, 2025, 68(1/2).
杨波,许海鹰,桑兴华,王壮. 自适应闭环控制的高频脉冲电子束偏压电路设计[J]. 航空制造技术, 2025, 68(1/2): 90-94. YANG Bo, XU Haiying, SANG Xinghua, WANG Zhuang. Design of High Frequency Pulsed Electron Beam Bias Circuit With Adaptive Closed-Loop Control[J]. Aeronautical Manufacturing Technology, 2025, 68(1/2): 90-94. DOI: 10.16080/j.issn1671-833x.2025.01/02.090.
YANG Bo, XU Haiying, SANG Xinghua, et al. Design of High Frequency Pulsed Electron Beam Bias Circuit With Adaptive Closed-Loop Control[J]. Aeronautical Manufacturing Technology, 2025, 68(1/2). DOI: 10.16080/j.issn1671-833x.2025.01/02.090.
Design of High Frequency Pulsed Electron Beam Bias Circuit With Adaptive Closed-Loop Control
According to the requirements of pulsed electron beam welding technology
the design of high-frequency pulsed electron beam bias circuit with adaptive closed-loop adjustment of beam current is realized by taking the structure design of fast controllable DC bias main circuit and the control circuit design of adaptive closed-loop adjustment of beam current as the core technology; The circuit parameters are simulated and verified by Cadence simulation software
and the circuit parameters are optimized. On this basis
a high-frequency pulsed electron beam bias circuit is developed
and its characteristics are verified by connecting it to the electron beam welding system. The results show that the pulsed electron beam can follow the set signal dynamically in real time
the working frequency can reach 1 kHz
the rising and falling speed of the beam is fast
the waveform is good and the distortion is small
which can effectively meet the requirements of the pulsed electron beam process.