In order to obtain a cost-effective electron beam surface treatment technology

using a constant frequency voltage regulator circuit

we developed a new type of bias pulse power supply. The power supply was composed of a bias main circuit topology

a bias voltage transformer and a bias rectification filter circuit

where the bias main circuit was composed of a bias base value generating circuit and a bias voltage generating circuit. The bias value generating circuit controls the bias voltage pulse base value

and the bias pulse generation circuit controls the bias pulse frequency and the duty ratio. The pulse base value

pulse frequency and duty ratio of the pulse bias power supply are continuously adjustable

and the amplitude

beam frequency and duty ratio of the pulse beam are adjusted accordingly. The waveforms of the output voltage of the pulsed bias power supply and the output waveform of the pulsed bias power supply are stable and tunable

which can meet the requirements of small beam spot pulse electron beam bombardment process.