In order to meet the urgent needs of optoelectronic devices and optical windows for transparent electromagnetic interference shielding materials with high optical transmittance and outstanding shielding effectiveness

research on electromagnetic shielding performance of transparent metal-mesh film is carried out. Metal-mesh films with different grid shapes

line widths and thicknesses are fabricated through the process of blading silver nanoparticle ink and electroplating Cu into the imprinted microgrooves. The effects of different structure parameters on the electromagnetic shielding

light transmittance and electrical conductivity of metal-mesh films are tested and analyzed. Results indicate that the fabricated metal-mesh film exhibits a shielding effectiveness (SE) up to 35 dB (0.95–18 GHz) and a sheet resistance less than 0.2 Ω/sq at 85% transmittance and 3% haze. Compared with other structure parameters

the increase of the thickness of the metal-mesh film can significantly improve its electromagnetic shielding effectiveness without affecting the optical performance.